Journal article
Artificial sub-μm magnetic patterning by He⁺ ion bombardment through a mask fabricated by Ultraviolet NanoImprint Lithography (UV-NIL)
Publication Details
Authors: | Schmidt, C.; Smolarczyk, M.; Gomer, L.; Hillmer, H.; Ehresmann, A. |
Publication year: | 2014 |
Journal: | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms |
Pages range : | 59-62 |
Volume number: | 322 |
ISSN: | 0168-583X |
DOI-Link der Erstveröffentlichung: |
URN / URL: |
Abstract
Light-ion bombardment induced magnetic patterning (IBMP) is a smart method to tailor the unidirectional anisotropy in exchange-bias layer systems. If the bombardment area is limited by shadow masks, artificial magnetic patterns can be generated which are stable in remanence. A method is described where it is possible to fabricate submicron magnetic patterns over large sample areas: Ultraviolet NanoImprint Lithography (UV-NIL) in combination with IBMP. We show the fabrication of artificial magnetic patterns with dimensions between 400 and 1000nm over cm2 areas.
Light-ion bombardment induced magnetic patterning (IBMP) is a smart method to tailor the unidirectional anisotropy in exchange-bias layer systems. If the bombardment area is limited by shadow masks, artificial magnetic patterns can be generated which are stable in remanence. A method is described where it is possible to fabricate submicron magnetic patterns over large sample areas: Ultraviolet NanoImprint Lithography (UV-NIL) in combination with IBMP. We show the fabrication of artificial magnetic patterns with dimensions between 400 and 1000nm over cm2 areas.
