Aufsatz in einer Fachzeitschrift
Magnetization reversal of exchange bias double layers magnetically patterned by ion irradiation
Details zur Publikation
Autor(inn)en: | Fassbender, J.; Poppe, S.; Mewes, T.; Mougin, A.; Hillebrands, B.; Engel, D.; Jung, M.; Ehresmann, A.; Schmoranzer, H.; Faini, G.; Kirk, K.; Chapman, J. |
Publikationsjahr: | 2002 |
Zeitschrift: | physica status solidi (a) – applications and materials science |
Seitenbereich: | 439-447 |
Jahrgang/Band : | 189 |
ISSN: | 1862-6300 |
eISSN: | 1862-6319 |
DOI-Link der Erstveröffentlichung: |
Zusammenfassung, Abstract
He+ ion irradiation is an excellent tool to modify the magnitude and direction of the exchange bias field on the sub-micrometer scale without affecting the sample topography. This effect has been utilized to magnetically pattern NiFe/FeMn exchange bias double layers using resist masks patterned by electron beam lithography. Ion irradiation through the masks leads to a local modification of the magnetization reversal behavior and allows to study the magnetization reversal as a function of the exchange bias field strength and the pattern dimensions on a single sample. Results are presented on the macroscopic and microscopic magnetization reversal using the magneto-optic Kerr effect and Lorentz microscopy.
He+ ion irradiation is an excellent tool to modify the magnitude and direction of the exchange bias field on the sub-micrometer scale without affecting the sample topography. This effect has been utilized to magnetically pattern NiFe/FeMn exchange bias double layers using resist masks patterned by electron beam lithography. Ion irradiation through the masks leads to a local modification of the magnetization reversal behavior and allows to study the magnetization reversal as a function of the exchange bias field strength and the pattern dimensions on a single sample. Results are presented on the macroscopic and microscopic magnetization reversal using the magneto-optic Kerr effect and Lorentz microscopy.
